A standard high density RF-DC plasma nitriding condition.
|Pre-sputtering||DC (500 V)|
|Nitrogen (75 Pa) at 693 K for 1.8 ks|
|Nitriding||RF (250 V), DC (300 V)|
|Nitrogen (100 mL/min)|
|Hydrogen (20 mL/min)|
|75 Pa at 693 K for 14.4 ks|
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