Table 2

Conditions of DLC deposition by I-PVD process.

Pre-treatment of substrate Ar+ bombard
DC −1 kV for 30 min
Gas species C6H6
Gas flow rate (sccm) 0.75
Gas pressure (Pa) 2.5×10−2
Bias voltage (kV) −1
Filament current (A) 30
Temperature (°C) 250
Deposition time (h) 2

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