Research Article

Feasibility study of the microforming combined with selective chemical vapor deposition

Tokyo Metropolitan University, 6-6 Asahigaoka, Hino-shi, Tokyo 191-0065, Japan

^* e-mail: koshimizu-kazushi@ed.tmu.ac.jp

Received: 7 October 2015
Accepted: 10 October 2015

Abstract

Microforming has been received much attention in the recent decades due to the wide use of microparts in electronics and medical applications. For the further functionalization of these micro devices, high functional surfaces with noble metals and nanomaterials are strongly required in bio- and medical fields, such as bio-sensors. To realize an efficient manufacturing process, which can deform the submillimeter scale bulk structure and can construct the micro to nanometer scale structures in one process, the present study proposes a combined process of microforming for metal foils with a selective chemical vapor deposition (SCVD) on the active surfaces of the working material. To demonstrate feasibility of this proposed process, feasibility of SCVD of functional materials onto active surfaces of titanium (Ti) was investigated. CVD of iron (Fe) and carbon nanotubes (CNTs) which construct CNTs on the patterned surfaces of the active Ti and non-active Ti oxidation layers were conducted. Ti thin films on silicon substrate and Fe were used as working materials and functional materials respectively. CNTs were grown only on the Ti surface. Consequently, selectivity of the active surface of Ti to the synthesis of Fe particles in CVD was confirmed.